The DWL 66 is a high precision, direct write laser lithography system for:

• Maskless lithography
• Photomask making
• Direct writing applications
• Gray-scale exposures
• Any flat material coated with a photosensitive layer

Main features include:

• Minimum feature size: 0.6 microns
• Substrate size: Up to 200 x 200 mm (8 x 8 inches)
• Over 1.0M dpi using a 20-nanometer writeable address grid