A VersaProbe™ Scanning XPS Microprobe was purchased from Physical Electronics in February of 2008. The Versa Probe can be used to analyze the chemical bond states as well as the quantitative composition of a variety of materials including metals, ceramics and polymers.
This highly automated XPS instrument uses a high flux X-ray source providing a highly focused monochromatic X-ray beam, (10µm to 200µm) that can be scanned upon the sample surface. The high resolution 180 degree spherical capacitor energy analyzer provides full- featured XPS analysis capability including XPS spectral, map, depth profile, line scan, and angle resolved analyses. An ultraviolet source may also be used for Ultraviolet Photoelectron Spectroscopy (UPS).
A 100V to 5kV differentially pumped Argon ion gun with regulated leak valve is available for specimen cleaning and sputter depth profiling with monolayer resolution.
The system has a dual-beam charge compensation system that utilizes both a cool-cathode electron flood source and the very-low-energy ion capability of the Argon ion sputter gun to provide neutralization for all sample types.
XPS Elemental Sensitivity and Energy Resolution (fine grained Ag)
X-ray Beam Size (300 Line-per-Inch Cu grid)