New Laurell chemcial processing stations are online!
Developing and Etching processes for 4"-5" Photomask Lift Off process for 3"-4" Wafers
New Trovato Organic Depositon...
For OLED fabrication
- Fully Automated Vacuum and Process Control
- 4 Material Co-Deposition
- Proprietary Ultra-High Resolution QCM Monitoring
- PC Based Multi-Layer Thin-Film Process Control
- 12 Evaporative Sources
- Multiple Substrate, In-Process Mask Changing
- Cryogenic Pumping - 12 Minutes to Process Pressure
- Integrated Glove Box System <1PPM -H2O, O2
- Vacuum Antechamber for Glovebox
- Compact Footprint - 114" Wide x 36" Deep x 76" High
- Optional Integrated Spin Coater, UV Ozone, Encapsulation