Tools and Instruments

The UNT Nanofabrication Cleanroom has a wide selection of processing tools, including dual e-Beam and sputtering systems for thin film development, and two RIE systems for metal and dielectric material etching of MEMS structures.

Sub-micron features are defined with a JEOL JSM-7001F SEM/EBL system with 3nm beam resolution and a Heidelberg DWL66 maskless laser writer for photomask pattern writing. Four wet benches, spin coater hood with tabletop spin coater (Laurell WS-650Mz) are used for lithography process. For characterization analysis, the cleanroom is equipped with a J.A. Woolam M-2000V Ellipsometer, KLA-Tenco D300 profiler and Nikon 66 microscope.

For current available tools, please check Tool Status. For tool scheduling, please check UNT FOM.

Equipment

Lithography

Deposition

Etching

Metrology

Packaging