Users are responsible for bringing necessary material for processing, eg. photoresist, development etc. Any material brought into cleanroom is subject to cleanroom manager for review.
Currently available tools:
- Heidelberg DWL-66s laser writer
- JEOL JSM-7001F SEM and EBL XPG2 pattern generator
- Laurell WS-650 Mz spin coater
- Reactive Ion Etcher (dielectric material)
- HP61 hot plate
- Nikon optphot 66
- UV Ozone cleaner
- KLA-Tencor D300 Profiler
- West Bond Wire Bonder
- Nanomaster Dual Ebeam Evaporator
- J.A. Woolam Co., Inc. M-2000V Automated Angle Ellipsometer
- Oerlikon Sputtering & Ebeam system
- Trovato organic deposition
- Chemical processing station for photomask developing and liftoff